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02102nam a2200397 a 4500 |
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20031007210922.0 |
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830307s1983 dcua b 101 0 eng |
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|a 83005968 //r936
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|a 2602381
|5 LACONCORD2021
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|a 0841207755
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|a (OCoLC)9371344
|5 LACONCORD2021
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|a LC
|b eng
|c LC
|d NUN
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050 |
0 |
0 |
|a TR940
|b .I57 1983
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050 |
1 |
4 |
|a TR940
|b .I57 1983
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|a 621.3815/31
|2 20
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4 |
|a 686.2/315
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|a Introduction to microlithography :
|b theory, materials, and processing /
|c L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.
|
260 |
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|a Washington, D.C. :
|b The Society,
|c 1983.
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300 |
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|a ix, 363 p. :
|b ill. ;
|c 24 cm.
|
440 |
|
0 |
|a ACS symposium series ;
|v 219.
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504 |
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|a Includes bibliographical references and index.
|
505 |
0 |
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|a An introduction to lithography / L.F. Thompson -- The lithographic process--the physics / L.F. Thompson and M.J. Bowden -- Organic resist materials--theory and chemistry / C. Grant Willson -- Resist processing / L.F. Thompson and M.J. Bowden -- Plasma etching / J.A. Mucha and D.W. Hess -- Multi-layer resist systems / B.J. Lin.
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650 |
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0 |
|a Microlithography
|v Congresses.
|
650 |
|
0 |
|a Photoresists
|x Congresses.
|
650 |
|
0 |
|a Plasma etching
|x Congresses.
|
650 |
|
0 |
|a Semiconductors
|x Etching
|x Congresses.
|
700 |
1 |
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|a Thompson, L. F.,
|d 1944-
|
700 |
1 |
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|a Willson, C. G.
|q (C. Grant),
|d 1939-
|
700 |
1 |
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|a Bowden, M. J.,
|d 1943-
|
710 |
2 |
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|a American Chemical Society.
|b Division of Organic Coatings and Plastics Chemistry
|
710 |
2 |
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|a American Chemical Society.
|b Meeting
|n (185th :,
|d 1983 :
|c Seattle, Wash.)
|
852 |
8 |
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|b CARM
|h A2:AN26F0
|i C06129
|p 0235944
|f BK
|
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|
952 |
f |
f |
|p Can circulate
|a CAVAL
|b CAVAL
|c CAVAL
|d CARM 1 Store
|e C06129
|f A2:AN26F0
|h Other scheme
|i book
|m 0235944
|