Vertical cavity surface emitting lasers /

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Detalhes bibliográficos
Autor principal: Sale, T. E. (Terence Edward), 1968-
Formato: Livro
Idioma:English
Publicado em: Taunton, Somerset, England : New York : Research Studies Press ; Wiley, c1995.
Colecção:Electronic & electrical engineering research studies. Optoelectronics series ; 2.
Electronic & electrical engineering research studies. Optoelectronics series ; 2.
Electronic & electrical engineering research studies. Optoelectronics series ; 2
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Acesso em linha:Publisher description
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100 1 |a Sale, T. E.  |q (Terence Edward),  |d 1968- 
245 1 0 |a Vertical cavity surface emitting lasers /  |c T.E. Sale. 
260 |a Taunton, Somerset, England :  |b Research Studies Press ;  |a New York :  |b Wiley,  |c c1995. 
300 |a xi, 312 p. :  |b ill. ;  |c 24 cm. 
490 1 |a Electronic & electrical engineering research studies. Optoelectronics series ;  |v 2. 
490 1 |a Electronic & electrical engineering research studies., Optoelectronics series ;  |v 2 
504 |a Includes bibliographical references and index. 
505 0 |a 1. Introduction. 1.1. Background topics. 1.2. Lasers for optical computing. 1.3. Development of the surface emitting laser. 1.4. Devices in other material systems. 1.5. VCSEL development -- 2. Theory of dielectric reflectors and VCSEL cavities. 2.1. Bragg reflector theory. 2.2. AIAs / GaAs reflector stacks. 2.3. Design of laser structure -- 2.4. Conclusions -- 3. Gain calculations for strained InGaAs / GaAs quantum wells. 3.1. Basic theory of optically assisted transitions. 3.2. Band structure of strained InGaAs quantum wells. 3.3. Details of gain calculations. 3.4. Calculations -- 4. Materials growth and device fabrication. 4.1. Growth. 4.2. Comparisons of MBE and MOCVD. 4.3. Fabrication of devices -- 5. Resistance considerations for Bragg reflectors. 5.1. Heterointerfaces. 5.2. Heterojunctions under bias. 5.3. I/V Characteristics of real Bragg reflectors. 5.4. Optical considerations -- 6. Case Study I: Measurements on MBE grown devices. 6.1. Structure. 6.2. Material assessment. 
505 8 |a 6.3. Experimental method. 6.4. Measurements on etched mesa devices. 6.5. Polyimide passivated devices. 6.6. Ion implanted devices -- 7. Case Study II: Measurements on MOCVD grown devices. 7.1. Growth structure. 7.2. Material assessment. 7.3. Processing. 7.4. Measurements on etched mesa devices. 7.5. C.W. operation. 7.6. Ion implanted devices -- 8. Analysis of experimental data. 8.1. Threshold conditions. 8.2. Thermal modelling. 8.3. Operating power range. 8.4. Reflector resistance -- 9. Further issues. 9.1. Controlling spontaneous emission. 9.2. Modulation speed. 9.3. Noise. 9.4. Integration I: arrays. 9.5. Integration II: functional devices. 9.6. Thermal and output power limitations. 
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830 0 |a Electronic & electrical engineering research studies. Optoelectronics series ;  |v 2. 
830 0 |a Electronic & electrical engineering research studies.  |p Optoelectronics series ;  |v 2 
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