Process and device modeling /
Saved in:
| Other Authors: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Amsterdam ; New York : New York, N.Y., U.S.A. :
North-Holland ; Sole distributors for the U.S.A. and Canada, Elsevier Science Pub. Co.,
1986.
|
| Series: | Advances in CAD for VLSI ;
v. 1 |
| Subjects: |
CARM 1 Store
| Call Number: |
A2:AJ25E0 C04666 |
|---|---|
| Copy 1 | Available Place a Hold |