Process and device modeling /

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Bibliographic Details
Other Authors: Engl, Walter L.
Format: Book
Language:English
Published: Amsterdam ; New York : New York, N.Y., U.S.A. : North-Holland ; Sole distributors for the U.S.A. and Canada, Elsevier Science Pub. Co., 1986.
Series:Advances in CAD for VLSI ; v. 1
Subjects:
Description
Physical Description:x, 461 p. : ill. ; 25 cm.
Bibliography:Includes bibliographies and index.
ISBN:0444878912 (U.S.)