Process and device simulation for MOS-VLSI circuits /

Gorde:
Xehetasun bibliografikoak
Erakunde egilea: NATO Advanced Study Institute on Process and Device Simulation for MOS-VLSI Circuits Urbino, Italy
Beste egile batzuk: Antognetti, Paolo
Formatua: Conference Proceeding Liburua
Hizkuntza:English
Argitaratua: Boston : Hingham, MA : Nijhoff ; Distributors for the U.S. and Canada, Kluwer Boston, 1983.
Saila:NATO ASI series. Applied sciences ; no. 62
Gaiak:
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050 0 0 |a TK7874  |b .N343 1982 
111 2 0 |a NATO Advanced Study Institute on Process and Device Simulation for MOS-VLSI Circuits  |d (1982 :  |c Urbino, Italy) 
245 1 0 |a Process and device simulation for MOS-VLSI circuits /  |c edited by Paolo Antognetti ... [et al.]. 
260 |a Boston :  |b Nijhoff ;  |a Hingham, MA :  |b Distributors for the U.S. and Canada, Kluwer Boston,  |c 1983. 
300 |a xii, 619 p. :  |b ill. ;  |c 25 cm. 
440 0 |a NATO ASI series.  |n Series E,  |p Applied sciences ;  |v no. 62 
500 |a "Proceedings of the NATO Advanced Study Institute on Process and Device Simulation for MOS-VLSI Circuits, SOGESTA, Urbino, Italy, July 12-23, 1982"--T.p. verso. 
500 |a "Published in cooperation with NATO Scientific Affairs Division." 
504 |a Includes bibliographical references. 
650 0 |a Integrated circuits  |x Very large scale integration  |x Simulation methods  |x Congresses. 
650 0 |a Metal oxide semiconductors  |x Simulation methods  |x Congresses. 
700 1 |a Antognetti, Paolo. 
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