Database for and statistical analysis of the interlaboratory determination of the conversion coefficient for the measurement of the interstitial oxygen content of silicon by infrared absorption /
Sábháilte in:
| Údar corparáideach: | |
|---|---|
| Rannpháirtithe: | , , |
| Formáid: | LEABHAR |
| Teanga: | English |
| Foilsithe / Cruthaithe: |
Gaithersburg, Md. : Washington, DC :
U.S. Dept. of Commerce, National Institute of Standards and Technology ; For sale by the Supt. of Docs., U.S. G.P.O.,
1989.
|
| Sraith: | Semiconductor measurement technology
NIST special publication ; 400-82 |
| Ábhair: |
CARM 1 Store
| Gairmuimhir: |
A3:AE31C0 F06472 |
|---|---|
| Cóip 1 | Ar fáil Cuir coinneáil air |